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Data: Limited

3 Methylamino 4 Nitrophenoxyethanol

IMAGE SOURCE: PubChem

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Other Concerns

Use restrictions (high)

SYNONYMS

● 2-[3-(METHYLAMINO)-4-NITROPHENOXY] ETHANOL
● 2-[3-(METHYLAMINO)-4-NITROPHENOXY]- ETHANOL
● 2-[3-(METHYLAMINO)-4-NITROPHENOXY]ETHANOL
● 3-METHYLAMINO-4-NITROPHENOXYETHANOL
● ETHANOL, 2-[3-(METHYLAMINO)-4-NITROPHENOXY]-

Unacceptable

Unacceptable: EWG VERIFIED products cannot contain this ingredient


3-Methylamino-4-Nitrophenoxyethanol is a substituted aromatic compound.

Common concerns

See how this product scores for common concerns.

  • LOW
    Cancer
  • LOW
    Allergies & Immunotoxicity
  • LOW
    Developmental and Reproductive Toxicity
  • HIGH
    Use Restrictions

Ingredient concerns

  • CONCERNS
  • DATA SOURCES

Products with this Ingredient

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Use restrictions

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CONCERN REFERENCE
Violation of government restrictions - Restricted in cosmetics; use, concentration, or manufacturing restrictions - anySCCPNFP Opinion on Fragrance Allergy
Restricted in cosmetics (recommendations or requirements) - use, concentration, or manufacturing restrictions - anyCosIng
Determined safe for use in cosmetics, subject to concentration or use limitations - anyCTFA International Cosmetic Ingredient Dictionary and Handbook

Cancer

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CONCERN REFERENCE
Cancer - limited evidenceCTFA International Cosmetic Ingredient Dictionary and Handbook

Data gaps

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CONCERN REFERENCE
Risk assessment method deficiencies and data gaps - Maximum reported "as used" concentration is basis of safety assessment by industry safety panel (Cosmetic Ingredient Review, CIR) - implicit safe concentration limit in productCosmetic Ingredient Review Assessments
1 studies in PubMed science library may include information on the toxicity of this chemicalNLM PubMed

Informational

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CONCERN REFERENCE
Industry or government recommendations for safe use: restrictions on concentration, impurities, product types, or manufacturing methods - anyCosmetic Ingredient Review Assessments
  • SCCPNFP (Scientific Committee On Cosmetic Products And Non-Food Products). 1999. Opinion Concerning Fragrance Allergy In Consumers. . SCCNFP/0017/98 Final, December 1999; and SCCPNFP (Scientific Committee On Cosmetic Products And Non-Food Products). 2000. An Initial List Of Perfumery Materials Which Must Not Form Part Of Fragrances Compounds Used In Cosmetic Products. SCCNFP/0320/00, final May 2000.
  • European Commission. 2013. Cosing, the European Commission database with information on cosmetic substances and ingredients. Accessed on March 1, 2013 at http://ec.europa.eu/consumers/cosmetics/cosing/ .
  • CTFA (Cosmetic, Toiletry and Fragrance Association). 2006. International Cosmetic Ingredient Dictionary and Handbook, 11th Edition. Color Additive Information. Washington, DC.
  • CIR (Cosmetic Ingredient Review). 2006. CIR Compendium, containing abstracts, discussions, and conclusions of CIR cosmetic ingredient safety assessments. Washington DC.
  • NLM (National Library of Medicine). 2012. PubMed online scientific bibliography data. http://www.pubmed.gov.

Understanding scores

Cosmetics and personal care products are not required to be tested for safety before being allowed on the market. The Skin Deep® scoring system was designed to help the public understand whether a product is safe to use or whether it contains ingredients of concern.

Every product and ingredient in Skin Deep gets a two-part score – one for hazard and one for data availability. The safest products score well by both measures, with a low hazard rating and a fair or better data availability rating.

HOW WE DETERMINE SCORES

Hazard score

The Skin Deep ingredient hazard score, from 1 to 10, reflects known and suspected hazards linked to the ingredients. The EWG VERIFIED® mark means a product meets EWG’s strictest criteria for transparency and health.

Score legend

Data availability

The Skin Deep data availability rating reflects the number of scientific studies about the product or ingredient in the published scientific literature.

NONE LIMITED FAIR GOOD ROBUST
Low Availability
Moderate Availability
High Availability

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September 23, 2023 | Los Angeles, CA

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